ZYUP Electronic grade ultrapure water system

Used in semiconductors, integrated circuit chips and packaging, liquid crystal displays, high-precision circuit boards, optoelectronic devices, various electronic devices, microelectronics industry, large-scale and ultra-large-scale integrated circuits require a large amount of pure water, ultrapure water to clean finished products and semi-finished products .

More styles      customizable

Parameter of DI Ultrapure Water Machine
1. Capacity: 250 liters per hour (Customized is available);
3. Working pressure: 0.2-0.4MPa; Working temperature: 4-45℃, Best temp.: 25℃;
4. Environment temperature: 5-40℃; humidity <85%RH;
3. Configuration: PLC touch screen+Quartz sand filter+Active carbon filter+Softener resin+Security filter+Double RO system+EDI system;
3.1. Optional parts: UF system, UV lamp, ozone generator, etc.
4. Diameter:
4.1. DN of PP filter: 5um;
4.2. DN of RO membrane: 0.0001-0.001um.
4.3. Salt/bacteria removal rate: ≥99%, recovery rate: ≥75%.

Model list

Among them, the key indicators of ultrapure water such as: conductivity (resistivity), total silicon, pH value, particle size, microorganisms, etc. all have different requirements. Therefore, circuit boards and circuit boards use pure water and ultrapure water. Due to the different process flows, the manufacturing process of ultrapure water is also different.

Note:If you need to know the process flow of a specific industry, please contact customer service.

1. Fully automatic PLC control. 2.Online testing of water quality. 3. The water tank is equipped with a liquid level control system, and the water pump has a high and low pressure protection device. 4. It has two operation modes: on-site control and centralized control. 5. Process and material selection can be customized according to customer requirements. 6. Main equipment systems (multi-media filters, activated carbon filters, precision filters, etc. constitute the pretreatment system, RO reverse osmosis host system, ion exchange mixed bed (EDI electric desalination system) system).

Application

1. Cleaning of aluminum foil and workpieces used in electrolytic capacitor production. 2. Electronic tube production, electron tube cathode coating carbonate liquid preparation. 3. Pure water for production and ingredients of picture tubes and cathode ray tubes. 4. Pure water for black and white picture tube fluorescent screen production, glass bulb cleaning, precipitation, humidification, film washing, and tube neck cleaning. 5. In the production of LCD monitors, the screen needs to be cleaned with pure water and mixed with pure water. 6. In transistor production, it is mainly used for cleaning silicon wafers, and a small amount is used for preparing medical solutions. 7. Cleaning silicon wafers with high-purity water in integrated circuit production. 8. Semiconductor materials, devices, printed circuit boards and integrated circuits. 9. LCD liquid crystal display, PDP plasma display. 10. Production of high-quality picture tubes and phosphors. 11. Production, processing and cleaning of semiconductor materials and wafer materials. 12. Ultrapure materials, ultrapure chemical reagents, and ultrapure chemical materials.